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WebSulfuric Peroxide Mixture (SPM, H2SO4 + H2O2) has been widely used in semiconductor manufacturing processes due to its high reactivity and attractive price. However, SPM releases SO42- ions that can be high impact on the environmental contaminations. Therefore, the SPM process requires a high cost wastewater treatment. So, the … WebAppears in 9 books from 1979-2004. Page 218 - International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. J. Ruzyllo and RE Novak eds., Vol. . Appears in 18 books from 1993-2004. Page 137 - Center for Advanced Electronic Materials Processing North Carolina State University, Raleigh, NC 27695-7920 Chemical … WebHandbook of Semiconductor Cleaning Technology, Noyes Publishing: Park Ridge, NJ, 1993 Ch 1. Checklist . The following checklist is designed to aid the researcher when performing this process. Solvent clean . Prepare solvent baths: acetone and methanol . Prepare RCA bath: 5 parts water (H2O), 1 part 30% hydrogen peroxide (H2O2), 1 philip bourdon